Abstract submission is closed.

Topics

This event is centered on showcasing developments across the whole spectrum of area-selective deposition. Thus, the Workshop will cover a wide range of topics including the following:

• Mechanisms and surface-dependent thin film nucleation and growth
• Surface passivation for controlled nucleation and growth
• Patterned deposition resists, including organic monolayers or polymers
• Chemical activation for nucleation enhancement
• Selectivity in thin film etching, including atomic layer etching (ALE)
• Precursor selection for area-selective deposition
• Processes and mechanisms for area-selective deposition using atomic layer deposition (ALD), molecular layer deposition (MLD), chemical vapor deposition (CVD), physical vapor deposition (PVD), and other thin film deposition techniques
• Metrology for area-selective deposition
• Applications for area-selective deposition in electronics manufacturing
• Applications for area-selective processing in catalysis, energy generation and storage, and other emerging areas
• Surface characterization techniques for defects formation and mitigation

Travel Support for Students, Postdocs, and Early-career researchers