Developments in nanoelectronics and nanoscale surface modification have continued to drive the need for more elegant and reliable bottom-up area selective deposition (ASD) strategies. Most notably, the semiconductor industry has relentlessly pursued sub-10 nm transistor fabrication for next-generation devices, an endeavor that increasingly relies on selective deposition techniques to facilitate proper material alignment. However, other fields beyond traditional transistor fabrication have also found potential applications for selective deposition. Mixed-material catalysts have consistently shown the benefits of having site-specific material growth, but new optical devices and materials for energy storage have also contributed to an increased focus on developing new strategies for ASD.
In an effort to help facilitate the progression of ASD techniques, the 7th Area Selective Deposition Workshop (ASD 2023) will be held on April 2-5, 2023 in Incheon National University, Incheon,Korea. Located in Songdo which is International Business District of Incheon, this year’s workshop will act as a central event for sharing and discussing the newest developments in ASD by gathering leading experts from both academia and industry. Attendees can expect to participate in talks regarding fundamental challenges related to recent developments in ASD, applications for ASD in next-generation technology, emergent processes for implementing ASD techniques, and new perspectives on metrological and characterization strategies for further understanding persistent mechanistic challenges.
Based on the success of the previous workshops, ASD2023 will consist of two days of presentations by invited and contributing speakers, as well as a banquet reception and poster session at the Incheon National University, Incheon. In addition, a half-day tutorial is scheduled prior to ASD2023 on Sunday afternoon to provide lectures about fundamentals of selective deposition, surface treatment, and functionalization. After the two days ASD2023 Workshop, one day special session will be held on Wednesday, focusing on ALD for semiconductors. As one of the centers in the Si device industrial supply chain, in Korea, we expect an open discussion forum for the current technological transition of Si devices and challenges for the next generation semiconductor technology.
This event is centered on showcasing developments across the whole spectrum of area-selective deposition. Thus, the Workshop will cover a wide range of topics including the following:
Mechanisms and surface-dependent thin film nucleation and growth
Surface passivation for controlled nucleation and growth
Patterned deposition resists, including organic monolayers or polymers
Chemical activation for nucleation enhancement
Selectivity in thin film etching, including atomic layer etching (ALE)
Precursor selection for area-selective deposition
Processes and mechanisms for area-selective deposition using atomic layer deposition (ALD), molecular layer deposition (MLD), chemical vapor deposition (CVD), physical vapor deposition (PVD), and other thin film deposition techniques
Metrology for area-selective deposition
Applications for area-selective deposition in electronics manufacturing
Applications for area-selective processing in catalysis, energy generation and storage, and other emerging areas
Surface characterization techniques for defects formation and mitigation
Stacey F Bent (Stanford University), ASD2020 Chair
Annelies Delabie (imec), ASD2016 Chair
John G Ekerdt (University of Texase), ASD2021 Chair
Dennis Hausmann (Lam Research)
Erwin Kessels (Eindhoven University of Technology)
Adrie Mackus (Eindhoven University of Technology), ASD2017 Chair
Ravi Kanjolia (EMD Electronics)
Gregory Parsons (North Carolina State University), ASD2018 Chair
Robert Clark (TEL)
Sean Barry (Carleton University)
Han-Bo-Ram Lee (Incheon National University), ASD2023 Chair
Marko Tuominen (ASM)
Sudipto Naskar (Intel)
Anuja DaSilva (Lam Research)
Kristen Colwell (Intel)
Seung Wook Ryu (SK hynix)
ASD 2023 will offer excellent sponsorship opportunities that will enable an organization to maximize the impression they make at the conference given their budget constraints. Please review our Sponsorship Form for more information.
Incheon International Airport is ranked one of the top airports in the world and is just 20 minutes by car or bus from INU's main campus in Songdo. Car and bus are your the best transportation options as there is no direct subway route to Songdo.
Taxi is the best option to get INU. It takes 30 min and the fare is around KRW30,000. A toll, KRW5,500, to cross Incheon Bridge will be added to the final fare.
If you prefer to drive out of Incheon International Airport, you can use the SK Rent-a-Car (https://www.skcarrental.com/) and Lotte Rent-a-car (https://www.lotterentacar.net/hp/eng/main/index.do) services. There are two car rental outlets at Exit 2 on the first floor, Terminal 1 of Incheon International Airport. Insurance is offered on all rental cars at Incheon International Airports. Cars can be reserved in advance. The campus has plenty of underground parking spaces for visitors and the fee is KRW1,000 for the first four hours or KRW5,000 for the whole day. You can find INU at Google Maps (https://goo.gl/maps/btpppYTksP9gLmq5A), but the Google Maps phone app does not give turn-by-turn directions in Korea.
It can be a little complicated to take a subway from the Incheon International Airport to Songdo as you will have to transfer from the Airport line to the Incheon line at Gyeyang Station. To buy a ticket, use one of the automated machines (KRW1,150). When purchasing your ticket, it is important to clearly state your destination. Get off at the the Incheon National University station and then walk or take the local bus/taxi to campus. Below is the subway map.