Platinum Sponsors

Abstract Submission Deadline: 

February 6, 2023

Author Acceptance Notifications: 

February 20, 2023

Early Registration: 

February 16, 2023 ~ March 3, 2023

Hotel Reservation Deadline: 

March 3, 2023

OVERVIEW


Developments in nanoelectronics and nanoscale surface modification have continued to drive the need for more elegant and reliable bottom-up area selective deposition (ASD) strategies. Most notably, the semiconductor industry has relentlessly pursued sub-10 nm transistor fabrication for next-generation devices, an endeavor that increasingly relies on selective deposition techniques to facilitate proper material alignment. However, other fields beyond traditional transistor fabrication have also found potential applications for selective deposition. Mixed-material catalysts have consistently shown the benefits of having site-specific material growth, but new optical devices and materials for energy storage have also contributed to an increased focus on developing new strategies for ASD.


In an effort to help facilitate the progression of ASD techniques, the 7th Area Selective Deposition Workshop (ASD 2023) will be held on April 2-5, 2023 in Incheon National University, Incheon,Korea. Located in Songdo which is International Business District of Incheon, this year’s workshop will act as a central event for sharing and discussing the newest developments in ASD by gathering leading experts from both academia and industry. Attendees can expect to participate in talks regarding fundamental challenges related to recent developments in ASD, applications for ASD in next-generation technology, emergent processes for implementing ASD techniques, and new perspectives on metrological and characterization strategies for further understanding persistent mechanistic challenges. 


Based on the success of the previous workshops, ASD2023 will consist of two days of presentations by invited and contributing speakers, as well as a banquet reception and poster session at the Incheon National University, Incheon. In addition, a half-day tutorial is scheduled prior to ASD2023 on Sunday afternoon to provide lectures about fundamentals of selective deposition, surface treatment, and functionalization. After the two days ASD2023 Workshop, one day special session will be held on Wednesday, focusing on ALD for semiconductors. As one of the centers in the Si device industrial supply chain, in Korea, we expect an open discussion forum for the current technological transition of Si devices and challenges for the next generation semiconductor technology.


SCHEDULE

  • April 2nd, Sunday: Tutorial for ASD
  • April 3rd, Monday: ASD Workshop Day 1
  • April 4th, Tuesday: ASD Workshop Day 2
  • April 5th, Wednesday: Special Session, ALD for Semiconductors

TECHNICAL PROGRAM

to be announced

INVITED SPEAKERS

 Tutorial for ASD Fundamentals (April 2nd)

Prof. Gregory Parsons, North Carolina State University, USA

"ASD by intrinsic surface properties"

Prof. Sean Barry, Carleton University, Canada

"Find 10 Differences Between These Precursors: ALD vs ASD Surface Chemistry"

Prof. Adrie Mackus, Eindhoven University of Technology, Netherlands

"ASD by Passivation: from Self-assembled Monolayers to Small Molecule Inhibitors"


 ASD2023 Workshop (April 3rd-4th)

Prof. Rong Chen, Huazhong University of Science and Technology, China

"Surface reaction kinetics for Inherent Selective Atomic Layer Deposition"

Prof. Ralf Tonner, Leipzig University, Germany

"Small molecule inhibitor-based approaches for area-selective deposition from first principles"

Dr. Marc Merkx, Eindhoven University of Technology, Netherlands

"The mechanisms of precursor blocking during area-selective ALD using small molecule inhibitors"

Dr. Eun Hyoung Cho, Samsung Advanced Institute of Technology, Korea

"Study on fabrication of seam-less gap filling through controlling of surface reactions in 3D structures"

Prof. Matthias Young, University of Missouri, USA

"Area selective atomic layer deposition enabled by writeable functional group patterning"

Prof. Soo Hyun Kim, Yeungnam University, Korea

"Selectively grown ALD-ZnO bottomless barrier for  Advanced Cu Metallization"

Prof. Mike Filler, Georgia Tech, USA

"Area Selective Deposition for Bottom-up Nanoelectronic Device Synthesis"

Dr. Keith Wong, Applied Materials, USA

"Strategies for Area-Selective Deposition at an Industrial Scale" 

Dr. Rachel Nye, Lam Research, USA

"Self-Assembling Monolayers vs Small Molecule Inhibitors in Area-Selective Deposition"

Dr. Sang Hoon Ahn, Samsung Electronics, Korea

"Area selective dielectric deposition beyond the scaling limit"

Dr. Dina Triyoso, TEL, USA

"Selective Deposition for Fully Self-Aligned Via: progress, challenges and opportunities"


 Special Session, "ALD for Semiconductors" (April 5th)

Prof. Hyungjun Kim, Yonsei University, Korea

"ALD for 2D TMDCs and Other Related Emerging Materials"

Dr. Seiyon Kim, SK hynix Fellow, SK hynix, Korea

"ALD Technology for Disruptive Semiconductor Devices : Evolutionary to Revolutionary Paths "

Dr. Zhebo Chen, Director of Global Product Management, Applied Materials, USA

"Enabling Advanced Metallization with Selective Deposition"


Dr. Hanjin Lim, VP of Technology, Samsung Electronics, Korea

"The Application of Selective Area Deposition in the 3D Semiconductor Structure"

Dr. Sang Ick Lee, VP of Technology, DNF, Korea

"Precursor Design Concept for Semiconductor and Display Process"

Dr. Tomonari Yamamoto, Vice President, TEL, Japan

"Enabling Process Technologies for Continuous Logic Scaling Towards 2-nm-node and Beyond

Prof. Kuan-Neng Chen, National Yang Ming Chiao Tung University, Taiwan

"3DIC Introduction and What Can ALD Do in 3DIC"


Prof. Anjana Devi, Ruhr-Universität Bochum, Germany

"Ligand Engineering: Gateway to New Precursors for Atomic Layer Processing"


ABSTRACT SUBMISSION 

How to submit abstracts

1. Download the abstract template & the copyright form from the links below.

2. Save your abstract file name as "LASTNAME-FirstInitial.PDF" 

3. Click the Submit Abstract.

4. Fill the form and attach abstract & copyright files.

Topics


This event is centered on showcasing developments across the whole spectrum of area-selective deposition. Thus, the Workshop will cover a wide range of topics including the following:

  • Mechanisms and surface-dependent thin film nucleation and growth
  • Surface passivation for controlled nucleation and growth
  • Patterned deposition resists, including organic monolayers or polymers
  • Chemical activation for nucleation enhancement
  • Selectivity in thin film etching, including atomic layer etching (ALE)
  • Precursor selection for area-selective deposition
  • Processes and mechanisms for area-selective deposition using atomic layer deposition (ALD), molecular layer deposition (MLD), chemical vapor deposition (CVD), physical vapor deposition (PVD), and other thin film deposition techniques
  • Metrology for area-selective deposition
  • Applications for area-selective deposition in electronics manufacturing
  • Applications for area-selective processing in catalysis, energy generation and storage, and other emerging areas
  • Surface characterization techniques for defects formation and mitigation

Travel Support for Students, Postdocs, and Early-career researchers

ASD2023 organizing committees and admiration office are happy to announce that we launch a travel support plan ($1,000 or $500) for graduate students, postdoc scholars and early-career researchers who are not able to have full grant support for international travel. The application submission page will be open when the pre-registration is open.


Support Plan

  • $1,000
  • $500


The organizing committee will review all applicants and select awardees based on total travel expenses, travel distance, presenter types, and academic/research level.  The number of awardees may be varied depending on the number of applicants and conference income 

REGISTRATION

Early Registration Open: February 16, 2023

Early Registration Close: March 3, 2023

This conference registration fee includes the following


  • Conference Materials
  • Poster Session/Welcome Reception
  • Buffer Lunch
  • Mid-Morning and Afternoon Breaks
  • Conference Banquet Dinner

Fees

  • Pre-registration (Until March 3rd, 2023)

Regular
Student 
ASD 
Tutorial
$150
$75
ASD 
Workshop
$400
$250
Special 
Session
$150
$75
Save $100, Three for $600!


  • Onsite registration

Regular
Student 
ASD 
Tutorial
$150
$75
ASD 
Workshop
$500
$300
Special 
Session
$150
$75
Save $100, Three for $700!

Travel Support for Students, Postdocs, and Early-career researchers

ASD2023 organizing committees and admiration office are happy to announce that we launch a travel support plan ($1,000 or $500) for graduate students, postdoc scholars and early-career researchers who are not able to have full grant support for international travel. The application submission page will be open when the pre-registration is open.


Support Plan

  • $1,000
  • $500


The organizing committee will review all applicants and select awardees based on total travel expenses, travel distance, presenter types, and academic/research level.  The number of awardees may be varied depending on the number of applicants and conference income 


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