ABSTRACT SUBMISSION

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 ABSTRACT SUBMISSION



Topics

This event is centered on showcasing developments across the whole spectrum of area-selective deposition. Thus, the Workshop will cover a wide range of topics including the following:

  • Mechanisms and surface-dependent thin film nucleation and growth
  • Surface passivation for controlled nucleation and growth
  • Patterned deposition resists, including organic monolayers or polymers
  • Chemical activation for nucleation enhancement
  • Selectivity in thin film etching, including atomic layer etching (ALE)
  • Precursor selection for area-selective deposition
  • Processes and mechanisms for area-selective deposition using atomic layer deposition (ALD), molecular layer deposition (MLD), chemical vapor deposition (CVD), physical vapor deposition (PVD), and other thin film deposition techniques
  • Metrology for area-selective deposition
  • Applications for area-selective deposition in electronics manufacturing
  • Applications for area-selective processing in catalysis, energy generation and storage, and other emerging areas
  • Surface characterization techniques for defects formation and mitigation




Travel Support for Students, Postdocs, and Early-career researchers



ASD2023 organizing committees and admiration office are happy to announce that we launch a travel support plan ($1,000 or $500) for graduate students, postdoc scholars and early-career researchers who are not able to have full grant support for international travel. The application submission page will be open when the pre-registration is open.


Support Plan
$1,000
$500


The organizing committee will review all applicants and select awardees based on total travel expenses, travel distance, presenter types, and academic/research level.  The number of awardees may be varied depending on the number of applicants and conference income 


Travel Support application submission is now closed.

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OVERVIEW

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OVERVIEW Developments in nanoelectronics and nanoscale surface modification have continued to drive the need for more elegant and reliable bottom-up area selective deposition (ASD) strategies. Most notably, the semiconductor industry has relentlessly pursued sub-10 nm transistor fabrication for next-generation devices, an endeavor that increasingly relies on selective deposition techniques to facilitate proper material alignment. However, other fields beyond traditional transistor fabrication have also found potential applications for selective deposition. Mixed-material catalysts have consistently shown the benefits of having site-specific material growth, but new optical devices and materials for energy storage have also contributed to an increased focus on developing new strategies for ASD. In an effort to help facilitate the progression of ASD techniques, the 7th Area Selective Deposition Workshop (ASD 2023) will be held on April 2-5, 2023 in Incheon National University, Incheon,Ko
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SCHEDULE

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  Technical Program (PDF) updated March 24 April 2nd, Sunday: Tutorial for ASD Time Event Lecture & Title Location 13:00-13:55 Registration 3rd floor, Faculty Bldg 13:55-14:00 Opening 3rd floor, Faculty Bldg 14:00-14:50 Class 1 Prof. Greg Parsons "ASD by intrinsic surface properties" 3rd floor, Faculty Bldg 14:50-15:00 Break 3rd floor, Faculty Bldg 15:00-15:50 Class 2 Prof. Adrie Mackus "ASD by Passivation: from Self-assembled Monolayers to Small Molecule Inhibitors" 3rd floor, Faculty Bldg 15:50-16:00 Break 3rd floor, Faculty Bldg 16:00-16:50 Class 3 Prof. Sean Barry "Find 10 Differences Between These Precursors ALD vs ASD Surface Chemistry" 3rd floor, Faculty Bldg 16:50-20-00 Reception 1st floor, Faculty Bldg April 3nd, Monday: ASD Workshop Day 1 Time Event Session Topic & Moderator Location 09:00-09:05 Opening Remark Conference Chair Auditorium 09:05-10:10 Session 1 Methodology Auditorium 10:10-10:30 Break Lobby 10:30-12:00 Session 2 Theory &
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INVITED SPEAKERS

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 INVITED SPEAKERS Tutorial for ASD Fundamentals (April 2nd) Prof. Gregory Parsons, North Carolina State University, USA "ASD by intrinsic surface properties"  Prof. Sean Barry, Carleton University, Canada "Find 10 Differences Between These Precursors:ALD vs ASD Surface Chemistry"  Prof. Adrie Mackus, Eindhoven University of Technology, Netherlands "ASD by Passivation: from Self-assembled Monolayers to Small Molecule Inhibitors"
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